Effect of technological parameters of the process of pulsed magnetron sputtering on the structure and phase composition on TiN-based coatings

Subject of research: coatings based on TiN deposited by pulsed magnetron sputtering have been studied.
 Purpose is to establish the effect technological parameters process sputtering: discharge current and N2 content in vacuum chamber structure phase composition TiN.
 Methods objects structural characteristics TiN-based coating were studied course X-ray diffraction analysis coatings. The microstructure formed was using scanning electron microscopy. object study samples VK6 hard alloy with coatings.
 Main results it has established that magnitude greatest influence coating. An increase leads a change formation single-phase (111) c-TiN cubic an degree texture optimal values ​​of are determined at which formed, minimum level internal stresses, smallest grain size, dense, columnar structure.